Plessey Ordered Aixtron MOCVD Reactor To Facilitate MicroLED Production
- Sep 22, 2018 -

Plessey announced in a press release yesterday (19) that it has purchased AIXTRON's AIX G5+ C organic metal chemical vapor deposition (MOCVD) reactor.

Previously, the company had ordered a reactor from aixtron.


Plessis is committed to producing the next generation of Micro LED applications using gallium nitride epitaxial wafers, while aixtron's MOCVD reactor will enhance the manufacturing capability of its gallium nitride epitaxial wafers.

The company plans to install the reactor at its Plymouth manufacturing plant (270,000 square meters) and operate it during the first quarter of 2019.


The new aixtron reactor provides an automatic cassette (C2C) wafer delivery module with two separate cavity configuration options for automatically loading and removing 8x6 "or 5x8" gallium silicon-based gallium nitride epitaxial plates in a closed card environment.

The existing aixtron MOCVD reactor can be manually loaded with 7x6in or 3x8in epitaxial wafers.


The automated cleaning of the new reactor ensures that the equipment is kept clean during each run, helping to reduce wafer defect rates and significantly reduce maintenance downtime.

In addition, the new device also has faster slant heating and cooling as well as higher base unloading temperatures, thus shortening the formulation time.


The AIX G5+ C reactor could enhance the development of single-chip Micro leds based on the company's proprietary gallium silicon-based nitride technology, plese said.

The company's Micro LED features extremely low power consumption, high brightness and ultra-high pixel density, which will bring potential impact to existing applications using traditional technologies such as LCD and OLED.


Plath aims to become a global leader in the development of innovative display engines and all-field spontaneous light Micro LED displays.

The device combines ultra-high-density RGB pixel array with high-performance complementary metal oxide semiconductor (CMOS) backplate, featuring high brightness, low power consumption and high frame frequency image source, and can be used in the headset display and wearable electronic devices of AR/VR systems.